◎ 2020
Launched the first generation Defect Classification System.
Launched the second generation EUV Pellicle Inspection Tool.
◎ 2019
Expanded our R & D center.
Launched the third generation Through POD Mask Inspection Tool.
Launched the third generation OQC Mask Inspection Tool.
Launched the second generation EUV Mask Inspection Tool.
Started the development of measurement technology in Optical CD Measure.
Started the development of AI classification technology in Defect Classification.
◎ 2018
Launched the first generation EUV Pellicle Inspection Tool.
Launched the first generation EUV Mask Inspection Tool.
Started the development of Optical Mask inspection technology applicable to Foundries.
◎ 2017
Launched the second generation Through POD Mask Inspection Tool.
Obtained 3 invention patents.
Started the development and application of EUV Mask and EUV Pellicle inspection technology.
◎ 2016
Launched the second generation OQC Mask Inspection Tool.
Obtained 6 utility model patents.
◎ 2015
Launched the first generation Through POD Mask Inspection Tool.
Started the application of Through POD Mask inspection technology.
◎ 2014
Started the development of Through POD Mask inspection technology.
Launched the first generation OQC Mask Inspection Tool.
Started the development and application of Optical Mask inspection technology applicable to Mask Shops.
◎ 2012
Obtained 1 utility model patent.
◎ 2011
Expanded into AceMach Co., Ltd.
◎ 2003
Established AceMach Ltd.
